Semiconductor device, method of manufacturing the same, and method of evaluating semiconductor device

ABSTRACT

A semiconductor device has: a silicon (semiconductor) substrate; a gate insulating film and a gate electrode, which are formed on the silicon substrate in this order; and source/drain material layers formed in recesses (holes) in the silicon substrate, the recesses being located beside the gate electrode. Here, each of side surfaces of the recesses, which are closer to the gate electrode, is constituted of at least one crystal plane of the silicon substrate.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a divisional of Ser. No. 11/009,011, filed Dec. 13,2004, which is based upon and claims the benefit of priority from theprior Japanese Patent Application No. 2004-187053, filed on Jun. 24,2004, the entire contents of which are incorporated herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a semiconductor device, a method ofmanufacturing the same, and a method of evaluating a semiconductordevice.

2. Description of the Related Art

In recent years, semiconductor devices including LSIs and the like havebeen miniaturized. However, the improvement of the performance of MOStransistors by miniaturization is approaching a limit. Attempts toimprove the performance in a generally used MOS transistor by modifyingthe structure thereof are being made. As one of such attempts, there isa method in which the mobility of carriers is improved by applyingappropriate stress to a channel region of the MOS transistor. There arevarious ways to apply the stress. In Non-Patent Document 1, recesses areformed in a silicon substrate on both sides of a gate electrode, andSiGe layers to be used as source/drain electrodes are epitaxially grownin the recesses, thus introducing strain into a channel by utilizing adifference in lattice constant between silicon and SiGe. According toNon-Patent Document 1, this structure is said to have the significanteffect in that the drive current of a p-type MOS transistor is improvedby 10% or more.

Moreover, in addition to Non-Patent Document 1, technologies related tothe present invention are also disclosed in Patent Documents 1 to 4.

(Patent Document 1) Japanese Unexamined Patent Publication No. Sho 58(1983)-35938

(Patent Document 2) Japanese Unexamined Patent Publication No. Hei 4(1992)-180633

(Patent Document 3) Japanese Unexamined Patent Publication No. Hei 7(1995)-50293

(Patent Document 4) WO98/40909 International Publication Pamphlet

(Non-Patent Document 1) T. Ghani et al., “A 90 nm High VolumeManufacturing Logic Technology Featuring Novel 45 nm Gate LengthStrained Silicon CMOS Transistors,” IEDM Tech Dig., pp. 978-980, (2003)

Incidentally, in the structure disclosed in Non-Patent Document 1,stress is applied to the channel from the SiGe layers as describedpreviously. If the amount of the stress is nonuniform in the gate widthdirection or varies among transistors, this transistor cannot beproduced in volume to be widely used.

Moreover, not only in the MOS transistor disclosed in Non-PatentDocument 1, but also in a general MOS transistor in which recesses forSiGe layers are not formed in a silicon substrate, when a new device orthe like is developed, a test MOS transistor is fabricated, andcharacteristics thereof are evaluated. Among a number ofcharacteristics, a carrier distribution in a channel greatly influencesthe performance of a transistor. Accordingly, it is preferable that thecarrier distribution is directly measured. However, a method ofmeasuring the carrier distribution has not been established so far.

SUMMARY OF THE INVENTION

According to an aspect of the present invention, there is provided asemiconductor device including: a semiconductor substrate; a gateinsulating film and a gate electrode which are formed on thesemiconductor substrate in this order; and a source/drain material layerformed in a hole in the semiconductor substrate, the hole being locatedbeside the gate electrode. Here, a side surface of the hole which iscloser to the gate electrode includes at least one crystal plane of thesemiconductor substrate.

In the above-described semiconductor device, the side surface of thehole in which the source/drain material layer is formed is constitutedof a crystal plane of the semiconductor substrate. Accordingly, ascompared to Patent Document 1 in which a side surface of a hole isconstituted of not a crystal plane but a curved surface, stress isstably applied to a channel under the gate electrode, and variation incharacteristics of MOS transistors among elements is suppressed.

Such a side surface of the hole may be constituted of two crystal planesof the semiconductor substrate, and a cross-sectional shape of the sidesurface may be concave. Such a cross-sectional shape makescharacteristics of the interface between the semiconductor substrate andthe gate insulating layer less prone to deterioration due to the stressbecause the stress has a peak at a position deeper than the surface ofthe semiconductor substrate, and can also make the reliability of theMOS transistor favorable while improving the drive capability thereof.

Alternatively, the following may be adopted: the side surface of thehole is constituted of two crystal planes of the semiconductorsubstrate, and a cross-sectional shape of the side surface is madeconvex. In the source/drain material layer formed in the hole havingsuch a cross-sectional shape, large stress is generated in directionsfrom the upper and lower surfaces of the source/drain material layertoward the channel, whereas stress becomes weak in the vicinity of thetop of the convex. Thus, stress favorable for the improvement in theperformance of a MOS transistor can be obtained.

Furthermore, instead of such a concave or convex side surface, the sidesurface of the hole may be constituted of a single crystal planeperpendicular to the semiconductor substrate. This allows uniform stresshaving a small strength variation in the depth direction to be stablyapplied to the channel from the source/drain material layer in the hole.

Moreover, according to another aspect of the present invention, there isprovided a method of manufacturing a semiconductor device, whichincludes the steps of: forming a gate insulating film on a semiconductorsubstrate; forming a gate electrode on the gate insulating film; forminga sidewall on a side surface of the gate electrode; forming a hole inthe semiconductor substrate beside the gate electrode using an organicalkaline solution or a tetramethylammonium hydroxide (TMAH) solution asan etchant, after forming the sidewall; and forming a source/drainmaterial layer in the hole.

In this method of manufacturing a semiconductor device, since the holeis formed in the semiconductor substrate using an organic alkalinesolution or a TMAH solution, a crystal plane of the semiconductorsubstrate appears at the etched surface, and a side surface of the holeis constituted of the crystal plane. Accordingly, the excellentreproducibility of the shape of the hole comes to be shown as comparedto the case where the side surface of the hole is constituted of acurved surface as in Patent Document 1. Even in the case where MOStransistors are integrally formed in the semiconductor substrate, stressis applied to the channel from the source/drain material layer formed inthe hole, without variation among elements.

Further, when the hole is formed, the thickness of the gate electrodemay be reduced by etching. In that case, a refractory metal layer isformed on the thinned gate electrode, and the refractory metal layer isheated to undergo reaction with the gate electrode, whereby the entiregate electrode is silicided. Such a gate electrode is called a metalgate. The above-described technique allows compatibility between aformation process of the metal gate and that of the hole.

Note that, in the case where the gate electrode does not need to beetched as described above, p-type impurities having the effect ofdelaying etching in a TMAH solution or an organic alkaline solution canbe introduced into the gate electrode in advance.

Furthermore, the following may be adopted: a first conductivity typeimpurity diffusion region and a second conductivity type impuritydiffusion region which is deeper than the first conductivity typeimpurity diffusion region are formed in the silicon substrate, and thehole is formed more deeply than the first conductivity type impuritydiffusion region. This causes the etch rate for forming the hole to varybetween the first and second conductivity type impurity diffusionregions due to differences in impurity concentration and conductivitytype between the impurity diffusion regions. Accordingly, a plurality ofcrystal planes appear at the side surface of the hole.

For example, in the case where the first conductivity type impuritydiffusion region is set to the p-type and the second conductivity typeimpurity diffusion region is set to the n-type, the side surface of thehole is constituted of two crystal planes, and the cross-sectional shapeof the side surface becomes a concave shape which bends at the interfacebetween these two crystal planes as a boundary.

On the other hand, in the case where the first conductivity typeimpurity diffusion region is set to the p-type and p-type impurities areintroduced into the second conductivity type impurity diffusion regionat a higher concentration than in the first conductivity type impuritydiffusion region, the side surface of the hole is constituted of twocrystal planes, and the cross-sectional shape of the side surfacebecomes a convex shape which bends at the interface between these twocrystal planes as a boundary.

Furthermore, an SOI substrate may be used as the semiconductorsubstrate. In the case where an SOI substrate is used, when the hole isformed by etching in a TMAH solution or an organic alkaline solution,the etch rate becomes low in the vicinity of a buried insulating filmpartially constituting the SOI substrate, and the etch rate variesdepending on the depth in the substrate. Thus, a plurality of crystalplanes appear at the side surface of the hole in etching, and thesecrystal planes constitute the side surface of the hole.

Moreover, in the case where a silicon substrate is used as thesemiconductor substrate, the surface orientation of the siliconsubstrate is set to (110), and the gate width direction is set to the[111] direction, whereby the side surface of the hole is constituted ofa (111) plane perpendicular to the surface of the silicon substrate.

On the other hand, in the case where the surface orientation of thesilicon substrate is set to (110) similarly to the above and the gatewidth direction is set to [100], the tilt of a (111) plane which isviewed from the surface of the silicon substrate becomes gentle, and thegentle (111) plane constitutes the side surface of the hole.

Furthermore, according to another aspect of the present invention, thereis provided a method of evaluating a semiconductor device, whichincludes the steps of: removing a gate electrode of a MOS transistor,which is formed in a semiconductor substrate, by selective etching usingan organic alkaline solution or a TMAH solution as an etchant; exposinga channel of the MOS transistor by removing a gate insulating film ofthe MOS transistor by wet etching; and investigating a carrierdistribution in the exposed channel using a microscope.

An organic alkaline solution and a TMAH solution provide high etchselectivity between semiconductor, such as silicon, and oxide, such assilicon dioxide. Accordingly, when the gate electrode of the MOStransistor is selectively etched, the thickness of the gate insulatingfilm under the gate electrode is scarcely reduced. As a result, in theabove-described method of evaluating a semiconductor device, damage doesnot easily occur in the channel under the gate insulating film, and thecarrier distribution in the channel is not easily disturbed.Accordingly, a carrier distribution in a state similar to that of actualuse can be obtained.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 contains cross-sectional views of samples used for investigatingthe etch selectivity between silicon and silicon dioxide in a TMAHsolution in a first embodiment of the present invention;

FIG. 2 is a graph obtained by investigating the etch rates of siliconand silicon dioxide in the TMAH solution in the first embodiment of thepresent invention;

FIG. 3 is a graph obtained by investigating the etch rates of siliconand silicon dioxide in an organic alkaline solution in the firstembodiment of the present invention;

FIG. 4 is a graph obtained by investigating the dependence of the etchrate in the TMAH solution on the concentration of impurities in thefirst embodiment of the present invention;

FIGS. 5A to 5G are cross-sectional views showing a method ofmanufacturing a semiconductor device according to a second embodiment ofthe present invention, in the process of manufacture;

FIG. 6 is a view drawn based on an SEM image of recesses after therecesses have been formed according to the second embodiment of thepresent invention;

FIG. 7 is a view drawn based on an SEM image in the case where thedistance d, by which each recess goes under a sidewall, is increased byadjusting the substrate temperature when the first sidewall insulatinglayer is formed in the second embodiment of the present invention;

FIGS. 8A to 8C are cross-sectional views of a semiconductor deviceaccording to a third embodiment of the present invention in the processof manufacture;

FIGS. 9A to 9D are cross-sectional views of a semiconductor deviceaccording to a fourth embodiment of the present invention in the processof manufacture;

FIG. 10 is a view drawn based on an SEM image of recesses after therecesses have been formed according to the fourth embodiment of thepresent invention;

FIGS. 11A to 11E are cross-sectional views of a semiconductor deviceaccording to a fifth embodiment of the present invention in the processof manufacture;

FIGS. 12A to 12D are cross-sectional views of a semiconductor deviceaccording to a sixth embodiment of the present invention in the processof manufacture;

FIGS. 13A to 13E are cross-sectional views of a semiconductor deviceaccording to a seventh embodiment of the present invention in theprocess of manufacture;

FIGS. 14A and 14B are cross-sectional views of a semiconductor deviceaccording to an eighth embodiment of the present invention in theprocess of manufacture;

FIG. 15 is a plan view of the semiconductor device according to theeighth embodiment of the present invention in the process ofmanufacture;

FIG. 16 is a cross-sectional view of a semiconductor device according toa ninth embodiment of the present invention in the process ofmanufacture;

FIG. 17 is a plan view of the semiconductor device according to theninth embodiment of the present invention in the process of manufacture;

FIGS. 18A to 18E are cross-sectional views of a TEG to be used in amethod of evaluating a semiconductor device according to a tenthembodiment of the present invention in the process of manufacture;

FIG. 19 is a perspective view for explaining the method of evaluatingthe semiconductor device according to the tenth embodiment of thepresent invention;

FIGS. 20A and 20B are views drawn based on a relief image obtained byactually measuring the TEG used in the tenth embodiment of the presentinvention, using a scanning tunneling microscope;

FIG. 21 is a view obtained by actually measuring the carrierdistribution in the TEG used in the tenth embodiment of the presentinvention;

FIG. 22 is a cross-sectional view of a TEG used in a method ofevaluating a semiconductor device according to an eleventh embodiment ofthe present invention; and

FIG. 23 is a perspective view for explaining the method of evaluatingthe semiconductor device according to the eleventh embodiment of thepresent invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

Hereinafter, best modes for carrying out the present invention will bedescribed in detail with reference to the accompanying drawings.

(1) First Embodiment

Recesses of a silicon substrate for growing SiGe layers can be formed bygenerally-used wet etching in which KOH or a mixture of hydrofluoricacid and nitric acid is used as an etchant. However, use of theseetchants makes it difficult to control the shapes of the recessesbecause the side surface of each recess becomes a gently curved surfaceas shown in FIG. 1 of Patent Document 1. Accordingly, there is variationin the shapes of the side surfaces of the recesses among elements, andcharacteristics of MOS transistors may therefore vary among theelements.

Moreover, if dry etching is used instead of the above-described wetetching, the surfaces of the recesses are damaged by plasma.Accordingly, lattice defects may be created in the SiGe layersepitaxially grown on the recesses.

In light of these points, the inventor of the present application hassearched for an etchant replacing KOH and a mixture of hydrofluoric acidand nitric acid to find out that a tetramethylammonium hydroxide (TMAH)solution can be used as a suitable etchant for forming the recesses.Furthermore, it has been found out that an organic alkaline solutionmade by mixing an alkaline solution, alcohol, and water is also suitableas the above-described etchant.

Accordingly, hereinafter, experiments which the inventor of the presentapplication performed in order to investigate etching characteristics ofthe TMAH and the organic alkaline solution will be described.

(a) Etch Selectivity

FIG. 1 contains cross-sectional views of samples used for investigatingthe etch selectivity between silicon and silicon dioxide in a TMAHsolution. Of these samples, sample S1 was prepared as described below.

First, a silicon dioxide layer 2 was formed on a silicon substrate 1 byplasma chemical vapor deposition (CVD) using silane (SiH₄), and then apolysilicon layer 3 having a thickness of 100 nm was formed bylow-pressure CVD (LPCVD) using silane as reactant gas. Subsequently, thesurface of the polysilicon layer 3 was exposed to nitric acid to beoxidized, thereby forming an oxide film 4 having a thickness ofapproximately 1.0 nm.

On the other hand, sample S2 was made by forming a polysilicon layer 3in the same way as that for sample S1 and then terminating the surfaceof the polysilicon layer 3 with hydrogen by exposure to hydrofluoricacid. A layer corresponding to the oxide film 4 of sample S1 was notformed.

Thereafter, a TMAH solution with a volume concentration of 5 to 30% wasprepared by dissolving TMAH in pure water, and the above-describedsamples S1 and S2 were wet-etched using this TMAH solution. Then, afterthis etching was performed for a predetermined time, the film thicknessof the native oxide film 4 of sample S1 and that of the polysiliconlayer 3 of sample S2 were measured using a film thickness gauge, and theresults of the measurements are compared with the initial filmthicknesses of these films, whereby etched amounts were estimated. Theresults are shown in FIG. 2.

The horizontal axis of FIG. 2 represents etching time in the TMAHsolution, and the vertical axis thereof represents the thickness of thepolysilicon layer 3 after etching.

As apparent from FIG. 2, etching does not proceed at all in sample S1 inwhich the native oxide film 4 is formed, whereas, in sample S2 in whichthe polysilicon layer 3 is exposed, the polysilicon layer 3 is etched asthe etching time proceeds.

The above-described results have revealed that the etch rate of silicondioxide in the TMAH solution can be regarded as 0 nm/min and that, onthe other hand, the etch rate of silicon is a finite value. Moreover,the result of other experiment performed by the inventor of the presentapplication has also revealed that the etch rate of silicon in the TMAHsolution depends on the temperature of the TMAH solution.

FIG. 3 is a graph obtained by performing the same experiment as theabove using an organic alkaline solution instead of the TMAH solution.The organic alkaline solution was prepared as follows: an ammoniumhydroxide solution with a concentration of 20 wt % or more was preparedby putting ammonium hydroxide in pure water, and then isopropyl alcohol(IPA) was dissolved in this ammonium hydroxide solution with aconcentration of 2 wt % or more.

As shown in FIG. 3, it has been revealed that the organic alkalinesolution also selectively etches silicon but does not etch silicondioxide.

Incidentally, an organic alkaline solution is not limited to theabove-described one. A mixed solution of an alkaline solution other thanan ammonium hydroxide solution and heavy alcohol, such as IPA or thelike, may be used as the organic alkaline solution.

(b) Dependence of Etch Rate in TMAH Solution on Impurity Concentration

In the above-described experiments of FIGS. 2 and 3, impurities were notintroduced into the polysilicon layer 3. However, it is speculated thatthe etch rate of the polysilicon layer 3 depends on the concentration ofimpurities. In order to confirm this point, the inventor of the presentapplication performed the experiment described below.

In this experiment, three samples having the same structure as that ofthe aforementioned sample S2 were prepared. Then, arsenic ions as n-typeimpurities and boron ions as p-type impurities are implanted into thepolysilicon layers 3 of two of these samples, respectively. The dopingamount in the ion implantation was set to 1.0×10¹⁷ cm⁻³ to 2.0×10²¹cm⁻³. Meanwhile, the polysilicon layer 3 of the other sample was leftundoped, that is, impurities were not introduced into the polysiliconlayer 3 of the other sample.

Thereafter, the polysilicon layers 3 of these samples were exposed tothe TMAH solution for a predetermined time, and the etched amounts ofthe polysilicon layers 3 were investigated. The results are shown inFIG. 4.

As shown in FIG. 4, it has been revealed that, in the case where then-type impurities (arsenic) have been introduced, the etch rate of thepolysilicon layer 3 becomes faster compared to the undoped case. On theother hand, it has been revealed that, in the case where the p-typeimpurities (boron) are introduced, the etch rate of the polysiliconlayer 3 becomes slower compared to the undoped case. Furthermore, otherexperiment performed by the inventor of the present application has alsorevealed that, in the case where the doping amount of boron is set toten times that shown in FIG. 4, the etching of the polysilicon layer 3hardly proceeds.

(2) Second Embodiment

Next, a method of fabricating a MOS transistor will be described. Inthis method, recesses are formed in a silicon substrate by utilizingetching characteristics of a TMAH solution or an organic alkalinesolution. The etching characteristics have been revealed in the firstembodiment, and SiGe layers in the recesses are used as source/drainelectrodes.

FIGS. 5A to 5G are cross-sectional views of a semiconductor deviceaccording to the present embodiment in the process of manufacture.

To begin with, steps to be performed before the cross-sectionalstructure shown in FIG. 5A is obtained will be described.

First, an element isolation trench 10 g for shallow trench isolation(STI) is formed in a p-type silicon (semiconductor) substrate 10 with(001) surface orientation, and then a silicon dioxide layer is buried asan element isolation insulating film 11 in the element isolation trench10 g. Thereafter, ion implantation is performed on the silicon substrate10 under the following conditions: for example, in the case wherephosphorus is used as n-type impurities, the acceleration energy isapproximately 300 keV or more, and the dose is 1×10¹³ cm⁻² or more.Thus, an n-well 12 is formed in a p-type MOS transistor formation regiondelimited by the element isolation insulating film 11.

Incidentally, in the case where a CMOS structure is formed byfabricating an n-type MOS transistor in addition to the p-type MOStransistor, a p-well (not shown) is formed by implanting, for example,boron ions as p-type impurities into an n-type MOS transistor formationregion of the silicon substrate 10 under the following conditions: theacceleration energy is 100 keV or more, and the dose is 1×10¹³ cm⁻² ormore. In this case, the p-type and n-type impurities are respectivelyimplanted using resist patterns (not shown) on the silicon substrate 10,and each resist pattern is removed in a wet process after ionimplantation.

Subsequently, the surface of the silicon substrate 10 is thermallyoxidized, thus forming a gate insulating film 13 which is made ofsilicon dioxide and which has a thickness of approximately 0.5 to 5.0nm. Here, a gate insulating film in which a very small amount ofnitrogen is added to silicon dioxide may be adopted as the gateinsulating film 13. Further, a polysilicon layer 14 having a thicknessof approximately 10 to 300 nm is formed on the gate insulating film 13by LPCVD using silane, and then ions of p-type impurities are implantedinto the polysilicon layer 14 at a concentration at which the etching ofpolysilicon in a TMAH solution does not proceed. In the presentembodiment, boron is adopted as such p-type impurities, and ionimplantation is performed on the polysilicon layer 14 under conditionsoptimized so that a sufficiently high concentration can be achieved inthe entire gate electrode. The conditions are an acceleration energy ofapproximately 0.5 to 20 keV and a dose of approximately 1×10¹⁴ to 1×10¹⁷cm⁻².

Next, steps to be performed before the cross-sectional structure shownin FIG. 5B is obtained will be described.

First, the polysilicon layer 14 is patterned into a gate electrode 14 cby photolithography.

In this example, though description will be made based on a process inwhich extensions and pockets are formed after gate processing withoutforming thin spacers, a method can also be adopted in which extensionand pocket implantation is performed after thin spacers havingthicknesses of 5 to 20 nm have been formed in order to form optimumoverlaps between the gate and the extensions. Further, a method can alsobe adopted in which spacers are formed only for one of the nMOS and thepMOS. Any spacer can be adopted as long as the spacer has the functionas a spacer, regardless of the film structure and shape of the spacer.

Subsequently, using the gate electrode 14 c as a mask, for example,boron ions as p-type impurities are implanted into the silicon substrate10 under the following conditions: the acceleration energy isapproximately 0.2 to 1.0 keV, the dose is approximately 1×10¹⁴ to 2×10¹⁵cm⁻², and the tilt angle is 0 to 15 degrees. Thus, first and secondsource/drain extensions 16 a and 16 b are shallowly formed in thesilicon substrate 10 beside the first and second side surfaces 14 a and14 b of the gate electrode 14 c. In the same positions, pocketimplantation for suppressing the short channel effect is performed underthe following conditions: for example, antimony is used, theacceleration energy is 30 to 80 keV, the dose is 1×10¹³ to 2×10¹⁴ cm⁻²,and the tilt angle is 0 to 35 degrees. In the case where BF2 is used asionic species for the source/drain extension implantation, optimumconditions are provided by setting the energy to 1 to 2.5 keV anddoubling the dose. The above-described optimum conditions change withthe presence or absence of spacers and the thicknesses thereof. In thecase where there are spacers, it is necessary to achieve optimumconditions by setting the energy for the pockets higher and setting thedose for the extensions larger. Further, pocket implantation usingarsenic, phosphorus, antimony, or the like can also be adopted, and thispocket implantation may be performed before and after the extensionimplantation.

Thereafter, a silicon dioxide layer is formed as a first sidewallinsulating layer 15 on the entire surface by plasma CVD using silaneunder conditions where the substrate temperature is approximately 600°C. or less, thus covering the first and second side surfaces 14 a and 14b of the gate electrode 14 c with the first sidewall insulating layer15. Note that, instead of the silicon dioxide layer, a silicon nitridelayer may be formed as the first sidewall insulating layer 15.

Next, steps to be performed before the cross-sectional structure shownin FIG. 5C is obtained will be described.

First, the first sidewall insulating layer 15 is etched back by plasmaetching to leave first sidewalls 15 a and 15 b on the first and secondside surfaces 14 a and 14 b. Further, in this etching, the portion ofthe gate insulating film 13 which is not covered with the firstsidewalls 15 a and 15 b is also etched, whereby the gate insulating film13 is left only under the gate electrode 14 c.

Furthermore, using the gate electrode 14 c and the first sidewalls 15 aand 15 b as a mask, for example, boron ions are implanted as p-typeimpurities (impurities of a first conductivity type) into the siliconsubstrate 10. Thus, source/drain regions 17 a and 17 b which are deeperand denser than the source/drain extensions 16 a and 16 b are formed inthe silicon substrate 10 beside the gate electrode 14 c.

Thereafter, the impurities in the source/drain regions 17 a and 17 b areactivated by performing activation anneal under the followingconditions: for example, the substrate temperature is approximately 950to 1050° C. This heat treatment may be omitted as needed.

Next, steps to be performed before the cross-sectional sectionalstructure shown in FIG. 5D is obtained will be described.

First, the silicon substrate 10 is immersed in a TMAH solution having avolume concentration of 5 to 30% and a temperature of 0 to 50° C.,thereby starting the etching of the silicon substrate 10. At this time,as in the experimental results shown in FIG. 2, the TMAH solutionselectively etches only silicon but does not etch silicon dioxide.Accordingly, in this etching, the first sidewalls 15 a and 15 b and theelement isolation insulating film 11 function as an etching mask, andthe portion of the silicon substrate 10 which is not covered with thisetching mask comes to be selectively etched.

Moreover, as in the experimental results shown in FIG. 4, the etch rateof silicon doped with p-type impurities in the TMAH solution is slow.Accordingly, the gate electrode 14 c into which boron ions are implantedat a high concentration in the step of FIG. 5A is hardly etched by thisTMAH solution.

In addition, in etching using the TMAH solution, (111) planes of thesilicon substrate 10 are neatly exposed to the outside, instead ofcurved surfaces as in Non-Patent Document 1. Accordingly, first andsecond recesses (holes) 10 a and 10 b having these (111) planes as firstand second side surfaces 10 c and 10 d are formed.

The depths of the first and second recesses 10 a and 10 b are controlledby etching time, and set to an optimum value in a range of approximately20 to 70 nm in the present embodiment.

Moreover, since the above-described etching also proceeds in thehorizontal direction, the upper end portions 10 e and 10 f of therecesses 10 a and 10 b, which are closer to the gate electrode 14 c, gounder the first sidewalls 15 a and 15 b by a distance d. As describedpreviously, the etch rate of the silicon substrate 10 in a TMAH solutiondepends on the concentration of impurities in silicon. Accordingly, theabove-described distance d can be controlled by adjusting theconcentrations of impurities in the source/drain extensions 16 a and 16b and the source/drain regions 17 a and 17 b.

Moreover, as shown in the experimental results of FIG. 2, silicondioxide is hardly etched by a TMAH solution. Accordingly, when therecesses 10 a and 10 b are being formed by etching in a TMAH solution,the etch rate of the silicon substrate 10 decreases near the sidewalls15 a and 15 b made of silicon dioxide. Consequently, the rate at whichthe upper end portions 10 e and 10 f go under the sidewalls 15 a and 15b due to etching is slow compared to other portions, and theabove-described entry length d can be easily controlled. Furthermore,the entry length d is also determined by the substrate temperature whenthe first sidewall insulating layer 15 is formed, and therefore can alsobe controlled by the relevant substrate temperature. This also appliesto each embodiment to be described later.

Note that use of an organic alkaline solution instead of a TMAH solutionalso makes it possible to expose neat (111) planes at the first andsecond side surfaces 10 c and 10 d and to control the entry length d ofeach recess 10 a and 10 b.

Next, steps to be performed before the cross-sectional structure shownin FIG. 5E is obtained will be described.

First, the silicon substrate 10 is put into a chamber (not shown) forepitaxial growth, and the substrate temperature is stabilized. Then, aSiGe layer with a Ge concentration of 3 to 30% is selectivelyepitaxially grown in each of the recesses 10 a and 10 b by supplying asilane-based gas or the like to the inside of the chamber. The SiGelayers selectively grow only on silicon but do not grow on the elementisolation insulating film 11 and the first sidewalls 15 a and 15 b,which are made of silicon dioxide.

Thereafter, when the thicknesses of the SiGe layers, which are measuredfrom the bottom surfaces of the respective recesses 10 a and 10 b, reachan optimum value of approximately 20 to 120 nm, the epitaxial growth isstopped, and the obtained SiGe layers are used as first and secondsource/drain material layers 18 a and 18 b.

The thicknesses of the source/drain material layers 18 a and 18 b arenot limited to the above. However, the distances between the bottomsurface of the n-well 12 and the upper surfaces of the source/drainmaterial layers 18 a and 18 b are increased by forming the uppersurfaces of the source/drain material layers 18 a and 18 b at positionshigher than the surface of the silicon substrate 10 as in the presentembodiment. This increases the distances between the p-n junction at thebottom surface of the n-well 12 and conductive plugs to be formed on thesource/drain material layers 18 a and 18 b later. Thus, a junctionleakage in the above-described p-n junction can be suppressed, and thereliability of the transistor can be improved.

Moreover, in the above, the source/drain material layers 18 a and 18 bare formed after the source/drain regions 17 a and 17 b have beenformed. However, the order of formation of these is not particularlylimited. The source/drain regions 17 a and 17 b may be formed after thesource/drain material layers 18 a and 18 b have been formed.

Next, in the present embodiment, boron ions are implanted as p-typeimpurities into the source/drain material layers 18 a and 18 b under thefollowing optimized conditions: the acceleration energy is approximately0.5 to 20 keV, and the dose is approximately 1×10¹⁴ to 1×10¹⁶ cm⁻².Then, the impurities in the source/drain regions 17 a and 17 b areactivated by performing activation anneal under the followingconditions; for example, the substrate temperature is approximately 950to 1050° C. In the case where in-situ doping is performed when thesource/drain regions 17 a and 17 b are formed, impurity implantation andheat treatment may be omitted.

Subsequently, as shown in FIG. 5F, for example, nickel layers asrefractory metal layers are formed by sputtering, and then a reaction iscaused between nickel and silicon by heat treatment, thereby formingfirst and second nickel silicide layers 19 a and 19 b on thesource/drain material layers 18 a and 18 b. A nickel silicide layer isalso formed on the surface layer of the gate electrode 14 c, whereby thegate electrode 14 c has a polycide structure. Thereafter, an unreactednickel layer is removed by wet etching.

Note that, instead of the nickel layers, cobalt layers may be formed asrefractory metal layers.

Next, steps to be performed before the cross-sectional structure shownin FIG. 5G is obtained will be described.

First, a silicon nitride layer is formed as a cover insulating layer 20on the entire surface by plasma CVD, and then a silicon dioxide layer isformed by high-density CVD (HDPCVD) which is excellent in fillingcapability. The silicon dioxide layer is used as an interlayerinsulating layer 21. Thereafter, in order to planarize projections anddepressions formed on the upper surface of the interlayer insulatinglayer 21 under the influence of projections and depressions of the gateelectrode 10 c and the like, the upper surface of the interlayerinsulating layer 21 is polished and planarized by chemical mechanicalpolishing (CMP).

Subsequently, the interlayer insulating layer 21 and the coverinsulating layer 20 are patterned by photolithography, thus formingfirst and second holes 21 a and 21 b having depths which reach thenickel silicide layers 19 a and 19 b. Then, a TiN layer is formed as aglue layer in the first and second holes 21 a and 21 b and on the uppersurface of the interlayer insulating layer 21 by sputtering, and atungsten layer is further formed thereon by CVD, whereby the holes 21 aand 21 b are completely filled with the tungsten layer. Thereafter,redundant portions of the tungsten layer and the glue layer, which areformed on the interlayer insulating layer 21, are polished by CMP to beremoved, but these films are left as first and second conductive plugs22 a and 22 b in the holes 21 a and 21 b.

Thereafter, the step of forming metal interconnections electricallyconnected to the conductive plugs 22 a and 22 b on the interlayerinsulating layer 21 is taken, but details thereof will be omitted.

Through the above-described steps, the basic structure of a p-type MOStransistor TR in which the source/drain material layers 18 a and 18 bare buried in the recesses 10 a and 10 b is completed.

In the MOS transistor TR, silicon lattice in the silicon substrate 10 isforcefully stretched so as to match the large lattice spacing of SiGedue to a mismatch between the lattice constant of the silicon substrate10 and those of the source/drain material layers 18 a and 18 b, andstress in the directions of the arrows in the drawing are applied to achannel under the gate electrode 14 c. As a result, compared to the casewhere stress is not applied, the mobility of carriers in the channel isimproved, and the drive capability of the MOS transistor can beimproved.

According to the above-described embodiment, in the step of FIG. 5D, aTMAH solution or an organic alkaline solution has been used as anetchant for forming the first and second recesses 10 a and 10 b.Accordingly, one (111) plane automatically appears at the first orsecond side surface 10 c or 10 d of each recess 10 a and 10 b, and theshape of each recess 10 a or 10 b can be easily controlled.Consequently, even when MOS transistors configured as described aboveare integrally formed in the silicon substrate 10, the shapes of therecesses 10 a and 10 b are less prone to vary among the MOS transistors,compared to Non-Patent Document 1 in which the first and second sidesurfaces 10 c and 10 d become curved surfaces. This makes it possible tosuppress variation in characteristics of MOS transistors among elementsand to improve the reliability of a semiconductor device such as an LSI.

FIG. 6 is a view drawn based on a scanning electron microscope (SEM)image of recesses 10 a and 10 b after the recesses 10 a and 10 b havebeen formed in accordance with the present embodiment. As shown in thisdrawing, (111) planes appear at the first and second side surfaces 10 cand 10 d constituting side surfaces of the first and second recesses 10a and 10 b.

The distance d to which each recess 10 a or 10 b goes under the firstsidewall 15 a or 15 b is not particularly limited.

FIG. 7 is a view drawn based on an SEM image in the case where theabove-described distance d is increased by adjusting the substratetemperature when the first sidewall insulating layer 15 is formed.

When the entry length d is made large as described above, the distancesbetween the channel under the gate electrode 10 c and the upper endportions 10 e and 10 f of the recesses 10 a and 10 b become short.Accordingly, stress can be efficiently applied from the upper endportions 10 e and 10 f to the channel. Such an advantage can also beobtained in each embodiment to be described later.

Incidentally, the present embodiment is not limited to the above. Forexample, the source/drain material layers 18 a and 18 b may beconstituted of metal layers made of a noble metal such as Pt (platinum),instead of the SiGe layers. In this case, the fabricated transistor TRis a Schottky transistor. This also applies to each embodiment to bedescribed later.

(3) Third Embodiment

Next, a method of manufacturing a semiconductor device according to athird embodiment of the present invention will be described.

FIGS. 8A to 8C are cross-sectional views of a semiconductor deviceaccording to the present embodiment in the process of manufacture. Notethat the components already described in the second embodiment aredenoted by the same reference numerals and codes in these drawings andwill not be further described below.

First, in accordance with the second embodiment, the structure shown inFIG. 5A is completed. However, though ions of p-type impurities havebeen implanted into the polysilicon layer 14 at a high concentrationsufficient to inhibit the etching of polysilicon in the TMAH solutionfrom proceeding in the second embodiment, ions of p-type impurities areimplanted into the polysilicon layer 14 at a low concentration at whichthe polysilicon layer 14 is etched by a TMAH solution partway in thepresent embodiment. In the present embodiment, boron is adopted as suchp-type impurities, and ions thereof are implanted into theabove-described polysilicon layer 14 under the following conditions: theacceleration energy is approximately 0.5 to 20 keV, and the dose isapproximately 1×10¹³ to 5×10¹⁵ cm⁻³.

Thereafter, the structure shown in FIG. 5C is obtained in accordancewith the aforementioned second embodiment.

Next, steps to be performed before the cross-sectional structure shownin FIG. 8A is obtained will be described.

First, the silicon substrate 10 is immersed in a TMAH solution having avolume concentration of 5 to 30% and a temperature of 0 to 50° C.,thereby starting the etching of the silicon substrate 10. At this time,since the concentration of the p-type impurities introduced into thepolysilicon layer 14 constituting the gate electrode 14 c has been setlow in advance, not only the silicon substrate 10 but also the uppersurface of the gate electrode 14 c are etched in this etching.

Then, when the depths of the first and second recesses 10 a and 10 breach approximately 20 to 70 nm and the thickness of the gate electrode14 c is reduced to approximately 30 to 150 nm, the above-describedetching is stopped. Thus, as shown in the drawing, a structure can beobtained, in which the first and second recesses 10 a and 10 b havingthe first and second side surfaces 10 c and 10 d constituted of (111)planes are formed, and in which the height of the gate electrode 14 c issmaller than those of the first sidewalls 15 a and 15 b.

Subsequently, as shown in FIG. 8B, SiGe layers to be used as first andsecond source/drain material layers 18 a and 18 b are selectivelyepitaxially grown in the first and second recesses 10 a and 10 b byperforming the aforementioned step of FIG. 5E.

Next, in the present embodiment, boron ions are implanted as p-typeimpurities into the source/drain material layers 18 a and 18 b under thefollowing optimized conditions: the acceleration energy is approximately0.5 to 20 keV, and the dose is approximately 1×10¹⁴ to 1×10¹⁶ cm⁻².Thereafter, the impurities in the source/drain regions 17 a and 17 b areactivated by performing activation anneal under the followingconditions: for example, the substrate temperature is approximately 950to 1050° C. In the case where in-situ doping is performed when thesource/drain regions 18 a and 18 b are formed, impurity implantation andheat treatment may be omitted. Next, as shown in FIG. 8C, nickel layersare respectively formed as refractory metal layers on the first andsecond source/drain material layers 18 a and 18 b and the gate electrode14 c by sputtering, and then a reaction is caused between nickel andsilicon by heat treatment, thereby forming nickel silicide layers 19 aand 19 b on the first and second source/drain material layers 18 a and18 b made of SiGe layers. This silicidation also occurs in the gateelectrode 14 c. However, since the thickness of the gate electrode 14 chas been reduced in the step of FIG. 8A in advance, the silicidationoccurs in the entire gate electrode 14 c, and the gate electrode 14 cbecomes a metal gate made of nickel silicide.

Note that, instead of the nickel layers, cobalt layers, platinum layers,or layers of a mixture of cobalt and platinum may be adopted asrefractory metal layers.

Thereafter, the aforementioned step of FIG. 5G is performed, therebycompleting the basic structure of a MOS transistor.

According to the present embodiment described above, the first or secondside surface 10 c or 10 d of each recess 10 a or 10 b can be constitutedof one (111) plane similarly to the second embodiment.

Furthermore, in the present embodiment, the concentration of the p-typeimpurities introduced into the gate electrode 14 c is set lower thanthat in the second embodiment, whereby the gate electrode 14 c is etchedsimultaneously with the formation of the recesses 10 a and 10 b usingthe TMAH solution and the height of the gate electrode 14 c is reduced.

This allows the gate electrode 14 c to become a metal gate bysilicidation simultaneously with the formation of the nickel silicidelayers 19 a and 19 b by siliciding the first and second source/drainmaterial layers 18 a and 18 b, and therefore allows compatibilitybetween a formation process of the metal gate and that of the recesses10 a and 10 b.

Incidentally, in the above, the TMAH solution has been used as anetchant when the recesses 10 a and 10 b are formed. However, anadvantage similar to the above can also be obtained when an organicalkaline solution is used instead of the TMAH solution.

(4) Fourth Embodiment

Next, a method of manufacturing a semiconductor device according to afourth embodiment of the present invention will be described.

FIGS. 9A to 9D are cross-sectional views of a semiconductor deviceaccording to the present embodiment in the process of manufacture. Notethat the components already described in the second embodiment aredenoted by the same reference numerals and codes in these drawings andwill not be further described below.

First, after the cross-sectional structure shown in FIG. 5C has beenobtained in accordance with the aforementioned second embodiment, asilicon dioxide layer having a thickness of approximately 5 to 100 nm isformed as a second sidewall insulating layer 25 on the silicon substrate10, the first sidewalls 15 a and 15 b, and the gate electrode 14 c, asshown in FIG. 9A. A method of forming the silicon dioxide layer is notparticularly limited. However, in the present embodiment, the silicondioxide layer is formed by CVD using silane as reactant gas. Further,instead of the silicon dioxide layer, a silicon nitride layer may beformed as the second sidewall insulating layer 25.

Next, steps to be performed before the cross-sectional structure shownin FIG. 9B is obtained will be described.

First, the second sidewall insulating layer 25 is etched back by plasmaetching to leave second sidewalls 25 a and 25 b on the side surfaces ofthe first sidewalls 15 a and 15 b. Sidewalls 26 a and 26 b eachincluding two insulating layers as described above are also referred toas double sidewalls.

Subsequently, using the second sidewalls 25 a and 25 b and the gateelectrode 14 c as a mask, ions of, for example, arsenic are implanted asn-type impurities into the silicon substrate 10 under the followingconditions: the acceleration energy is approximately 3 to 20 keV, andthe dose is 1×10¹⁴ to 5×10¹⁵ cm⁻². Thus, in the silicon substrate 10,first and second impurity diffusion regions 27 a and 27 b of a secondconductivity type (n-type) are formed more deeper than the source/drainextensions 16 a and 16 b of the first conductivity type (p-type).

Next, steps to be performed before the cross-sectional structure shownin FIG. 9C is obtained will be described.

First, the silicon substrate 10 is immersed in a TMAH solution having avolume concentration of 5 to 30% and a temperature of 0 to 50° C.,thereby starting the etching of the silicon substrate 10. Thus, firstand second recesses 10 a and 10 b having depths of approximately 20 to80 nm, which are deeper than that of the source/drain extensions 16 aand 16 b, are formed in the silicon substrate 10 beside the gateelectrode 14 c.

At this time, as apparent from the experimental results described usingFIG. 4, silicon into which n-type impurities are introduced has a higheretch rate in a TMAH solution, compared to silicon into which p-typeimpurities are introduced. Accordingly, the etching of the first andsecond impurity diffusion regions 27 a and 27 b into which the n-typeimpurities (arsenic) are introduced proceeds faster in the TMAH solutioncompared to those of the first and second source/drain extensions 16 aand 16 b and the source/drain regions 17 a and 17 b into which thep-type impurities (boron) are introduced.

In the case where etch rates differ between two layers as describedabove, different etched surfaces are exposed to the outside on oppositesides of the interface between these layers. Accordingly, at the firstand second side surfaces 10 c and 10 d of each of the recesses 10 a and10 b, (111) planes appear in portions which are in contact with thefirst and second impurity diffusion regions 27 a and 27 b of the p-type,whereas other (111) planes different from the above-described onesappear in portions which are in contact with the first and secondsource/drain extensions 16 a and 16 b and the source/drain regions 17 aand 17 b, which are of the n-type.

As a result, in the present embodiment, the first and second recesses 10a and 10 b can be obtained in which each of the first and second sidesurfaces 10 c and 10 d is constituted of two different (111) planes andin which the cross-sectional shapes of the first and second sidesurfaces 10 c and 10 d are concave shapes recessed below the gateelectrode 14 c.

Note that the recesses 10 a and 10 b having the above-describedcross-sectional shapes can also be formed using an organic alkalinesolution instead of the TMAH solution.

Thereafter, as shown in FIG. 9D, SiGe layers are selectively epitaxiallygrown in the recesses 10 a and 10 b by performing the aforementionedstep of FIG. 5E, respectively. The SiGe layers are used as first andsecond source/drain material layers 18 a and 18 b.

Thereafter, the aforementioned steps of FIGS. 5F and 5G are performed,thereby completing the basic structure of a MOS transistor.

According to the present embodiment described above, as shown in FIG.9B, at positions deeper than the first and second source/drainextensions 16 a and 16 b and the source/drain regions 17 a and 17 b,which are of the p-type, the first and second impurity diffusion regions27 a and 27 b of the n-type, which is opposite to the conductivity typeof the foregoing, have been formed. Due to this difference inconductivity type, different (111) planes appear at each of the firstand second side surfaces 10 c and 10 d of the first and second recesses10 a and 10 b when these recesses 10 a and 10 b are formed using theTMAH solution in the step of FIG. 9C, and the first and second recesses10 a and 10 b can be obtained in which the cross-sectional shapes of thefirst and second side surfaces 10 c and 10 d are concave shapes recessedbelow the gate electrode 14 c.

FIG. 10 is a view drawn based on an SEM image of recesses 10 a and 10 bafter the recesses 10 a and 10 b have been formed in accordance with thepresent embodiment. As shown in this drawing, two different (111) planesappear at each of the respective side surfaces of the first and secondrecesses 10 a and 10 b.

Such a recess shape makes characteristics of interface between thesilicon substrate 10 and the gate insulating film 13 less prone to beingdeteriorated by stress because the stress has a peak at a positionslightly deeper than the surface of the silicon substrate 10 asrepresented by the arrows in FIG. 9D, and therefore can achieveexcellent reliability of the MOS transistor while improving the drivecharacteristics thereof.

(5) Fifth Embodiment

Next, a method of manufacturing a semiconductor device according to afifth embodiment of the present invention will be described.

FIGS. 11A to 11E are cross-sectional views of a semiconductor deviceaccording to the present embodiment in the process of manufacture. Notethat the components already described in the second to fourthembodiments are denoted by the same reference numerals and codes inthese drawings and will not be further described below.

As described below, a silicon-on-insulator (SOI) substrate is used as asemiconductor substrate in the present embodiment.

To begin with, steps to be performed before the cross-sectionalstructure shown in FIG. 11A is obtained will be described.

First, an SOI substrate 30 in which a buried insulating layer 32 and asilicon layer 33 are formed on a silicon substrate 31 is prepared by,for example, bond-and-etch-back technique. Then, an element isolationtrench 33 g having a depth which reaches the buried insulating layer 32is formed in the silicon layer 33. Furthermore, a silicon dioxide layeris buried as an element isolation insulating film 11 in the elementisolation trench 33 g.

The surface orientation of the silicon layer 33 is not particularlylimited. However, in the present embodiment, the silicon layer 33 isformed so that the orientation thereof becomes (001). Further, a silicondioxide layer having a thickness of, for example, approximately 5 to 100nm is formed as the buried insulating layer 32.

Next, as shown in FIG. 11B, an n-well 34 is formed in a p-type MOStransistor formation region delimited by the element isolationinsulating film 11 by implanting phosphorus ions as n-type impuritiesinto the silicon layer 33 under the following conditions: theacceleration energy is approximately 300 keV or more, and the dose is1×10¹³ cm⁻³ or more.

Subsequently, the surface of the silicon layer 33 is thermally oxidized,thus forming a gate insulating film 13 which is made of silicon dioxideand which has a thickness of approximately 0.5 to 5.0 nm. Here, a gateinsulating film in which a very small amount of nitrogen is added tosilicon dioxide may be adopted as the gate insulating film 13. Further,a polysilicon layer 14 having a thickness of approximately 10 to 300 nmis formed on the gate insulating film 13 by LPCVD using silane, and thenions of p-type impurities are implanted into the polysilicon layer 14 ata concentration which is similar to that of the second embodiment and atwhich the etching of polysilicon in a TMAH solution does not proceed.

Thereafter, the structure shown in FIG. 11C is obtained by performingthe aforementioned steps of FIGS. 5B and 5C. In this structure, thefirst and second source/drain extensions 16 a and 16 b and thesource/drain regions 17 a and 17 b are formed in the silicon layer 33beside the gate electrode 14 c.

Next, the silicon substrate 10 is immersed in a TMAH solution having avolume concentration of 5 to 30% and a temperature of 0 to 50° C.,thereby starting the etching of the silicon substrate 10. Thus, as shownin FIG. 1D, first and second recesses 33 a and 33 b having depths ofapproximately 5 to 50 nm are formed in the silicon layer 33 beside thegate electrode 14 c.

According to the experimental results shown in FIG. 2, a TMAH solutionselectively etches only silicon but does not etch silicon dioxide.Accordingly, in this etching, the etch rate of the silicon layer 33becomes low in the vicinities of the gate insulating film 13 and theburied insulating layer 32, which are made of silicon dioxide, whereasthe etch rate becomes fast in a portion located apart from theseinsulating layers. Due to such a difference in etch rate, each of thefirst and second side surfaces 33 c and 33 d constituting the sidesurfaces of the recesses 33 a and 33 b is not constituted of a singlecrystal plane but constituted of two different (111) planes, and thecross-sectional shape thereof becomes convex.

The recesses 33 a and 33 b having the above-described cross-sectionalshapes can also be formed using an organic alkaline solution instead ofthe TMAH solution.

Thereafter, as shown in FIG. 11E, SiGe layers are selectivelyepitaxially grown in the recesses 33 a and 33 b by performing theaforementioned step of FIG. 5E, respectively. The SiGe layers are usedas first and second source/drain material layers 18 a and 18 b.

Thereafter, the aforementioned steps of FIGS. 5F and 5G are performed,thereby completing the basic structure of a MOS transistor.

According to the present embodiment described above, in the etchingusing the TMAH solution which has been described in FIG. 11D, the etchrate of the silicon layer 33 becomes low in the vicinity of the gateinsulating film 13 and in the vicinity of the buried insulating film 32partially constituting the SOI substrate 30. As a result, the etch rateof the silicon layer 33 varies depending on the depth. Accordingly, eachof the first and second side surfaces 33 c and 33 d of the first andsecond recesses 33 a and 33 b obtained by the above-described etching isconstituted of two different (111) planes, and the cross-sectional shapethereof becomes convex.

As represented by the arrows in FIG. 11E, the first and secondsource/drain material layers 18 a and 18 b formed in the recesses 33 aand 33 b having the above-described cross-sectional shapes generatestrong stress at the upper and lower surfaces of the silicon layer 33. Astress distribution can be obtained in which stress becomes weak at theintermediate position of the film where both (111) planes intersect eachother.

(6) Sixth Embodiment

Next, a method of manufacturing a semiconductor device according to asixth embodiment of the present invention will be described.

FIGS. 12A to 12D are cross-sectional views of a semiconductor deviceaccording to the present embodiment in the process of manufacture. Inthese drawings, the components already described in the second to fourthembodiments are denoted by the same reference numerals and codes andwill not be further described below.

In the aforementioned fifth embodiment, the first and second recesses 33a and 33 b having convex cross-sectional shapes are formed by using theSOI substrate 30. On the other hand, in the present embodiment, recesseshaving the same cross-sectional shapes as the above-described ones areformed using not an SOI substrate but a general silicon substrate.

First, the cross-sectional structure shown in FIG. 12A is obtained byperforming the aforementioned steps of FIGS. 5A to 5C.

Subsequently, as shown in FIG. 12B, boron ions are implanted as p-typeimpurities which have the effect of delaying etching in a TMAH solution,into the silicon substrate 10 using the gate electrode 14 c and thefirst sidewalls 15 a and 15 b as a mask, thus forming third and fourthimpurity diffusion regions 35 a and 35 b of the p-type. As conditionsfor this ion implantation, conditions are adopted under which the thirdand fourth impurity diffusion regions 35 a and 35 b have higherconcentrations and deeper depths than the source/drain extensions 16 aand 16 b and the source/drain regions 17 a and 17 b, which are of thep-type. In the present embodiment, as such conditions, for example,boron implantation under conditions where the acceleration energy isapproximately 1 to 20 keV and where the dose is approximately 5×10¹⁴ to2×10¹⁶ cm⁻² is adopted. As a result of such ion implantation, the thirdand fourth impurity diffusion regions 35 a and 35 b which are of thep-type and which densely spread to portions of the silicon substrate 10that are at deeper positions than the source/drain regions 17 a and 17 bare formed.

Thereafter, activation anneal is performed by adopting the sameconditions as those in the second embodiment, thus activating theimpurities in the source/drain regions 17 a and 17 b.

Incidentally, the order of formation of the third and fourth impuritydiffusion regions 35 a and 35 b and the source/drain regions 17 a and 17b is not particularly limited to the above. For example, theabove-described order may be reversed to form the source/drain regions17 a and 17 b after the third and fourth impurity diffusion regions 35 aand 35 b have been formed.

Subsequently, the silicon substrate 10 is immersed in a TMAH solutionhaving a volume concentration of 5 to 30% and a temperature of 0 to 50°C., thereby starting the etching of the silicon substrate 10. Thus,first and second recesses 10 a and 10 b having depths of approximately30 to 120 nm are formed in the silicon substrate 10 beside the gateelectrode 14 c as shown in FIG. 12C.

As described in FIGS. 2 and 3, in the etching of silicon in a TMAHsolution, the etch rate becomes low in silicon dioxide and silicon intowhich p-type impurities are introduced at a high concentration.Accordingly, in this etching, the etch rate becomes low in the vicinityof the gate insulating film 13 made of silicon dioxide and in thevicinities of the third and fourth impurity diffusion regions 35 a and35 b into which the p-type impurities are introduced at a highconcentration, whereas the etch rate does not become low in a portionlocated apart from the foregoing. Due to such an uneven etch rate, eachof the first and second side surfaces 10 c and 10 d of the respectiverecesses 10 a and 10 b is not constituted of a single crystal plane butconstituted of two different (111) planes, similarly to the fifthembodiment. The cross-sectional shape thereof becomes convex.

The recesses 10 a and 10 b having the above-described cross-sectionalshapes can also be formed using an organic alkaline solution instead ofthe TMAH solution.

Subsequently, as shown in FIG. 12D, SiGe layers are selectivelyepitaxially grown in the recesses 10 a and 10 b by performing theaforementioned step of FIG. 5E, respectively. The SiGe layers are usedas first and second source/drain material layers 18 a and 18 b.

Thereafter, the aforementioned steps of FIGS. 5F and 5G are performed,thereby completing the basic structure of a MOS transistor.

According to the present embodiment described above, p-type impuritieswhich have the effect of delaying etching in a TMAH solution have beenintroduced into the third and fourth impurity diffusion regions 35 a and35 b. Accordingly, in the etching step of FIG. 12C, the etch rate ofsilicon becomes low in the vicinities of the third and fourth impuritydiffusion regions 35 a and 35 b and the gate insulating film 13. As aresult, as shown in FIG. 12C, each of the first and second side surfaces10 c and 10 d of the first and second recesses 10 a and 10 b isconstituted of two (111) planes, and the first and second recesses 10 aand 10 b having convex cross-sectional shapes can be formed. Thus,stress favorable for the improvement in the mobility can be applied tothe channel from the source/drain material layers 18 a and 18 b formedin the respective recesses 10 a and 10 b.

(7) Seventh Embodiment

Next, a method of manufacturing a semiconductor device according to aseventh embodiment of the present invention will be described.

FIGS. 13A to 13E are cross-sectional views of a semiconductor deviceaccording to the present embodiment in the process of manufacture. Inthese drawings, the components already described in the second to sixthembodiments are denoted by the same reference numerals and codes andwill not be further described below.

In the aforementioned sixth embodiment, as shown in FIG. 12B, the thirdand fourth impurity diffusion regions 35 a and 35 b for delaying etchingin the TMAH solution have been formed using the gate electrode 14 c andthe first sidewalls 15 a and 15 b as a mask for ion implantation.

On the other hand, in the present embodiment, before a gate electrode 14c is formed, an impurity diffusion region having the effect ofincreasing the etch rate is formed.

First, as shown in FIG. 13A, an element isolation insulating film 11 isformed in an element isolation trench 10 g, and then an n-well 12 isformed in a p-type MOS transistor formation region delimited by theelement isolation insulating film 11.

Subsequently, boron ions are implanted as n-type impurities, which havethe effect of delaying etching in a TMAH solution, into a siliconsubstrate 10 under conditions where the acceleration energy isapproximately 5 to 30 keV and where the dose is approximately 1×10¹³ to5×10¹⁵ cm⁻³, thus forming a fifth impurity diffusion region 36 at aposition deeper than source/drain regions to be formed later.

Next, as shown in FIG. 13B, a gate insulating film 13 made of silicondioxide is formed by thermally oxidizing the surface of the siliconsubstrate 10, and a polysilicon layer 14 is further formed on the gateinsulating film 13 by LPCVD using silane. Thereafter, adopting ionimplantation conditions similar to those of the second embodiment, ionsof p-type impurities are implanted into the polysilicon layer 14 at aconcentration at which the etching of polysilicon in a TMAH solutiondoes not proceed.

Subsequently, as shown in FIG. 13C, source/drain extensions 16 a and 16b and source/drain regions 17 a and 17 b are formed in the siliconsubstrate 10 beside the gate electrode 14 c by performing theaforementioned steps of FIGS. 5B and 5C.

Then, the silicon substrate 10 is immersed in a TMAH solution having avolume concentration of 5 to 30% and a temperature of 0 to 50° C.,thereby starting the etching of the silicon substrate 10. Thus, firstand second recesses 10 a and 10 b having depths of approximately 20 to150 nm are formed in the silicon substrate 10 beside the gate electrode14 c as shown in FIG. 13D.

In this etching, the etch rate of silicon increases in the vicinity ofthe fifth impurity diffusion region 36 into which the n-type impuritieshaving the effect of increasing the etch rate are introduced at a highconcentration, whereas the etch rate of silicon decreases in thevicinities of the source/drain extensions 16 a and 16 b and thesource/drain regions 17 a and 17 b into which the p-type impurities areintroduced at a high concentration. Accordingly, for the same reason asthat in the sixth embodiment, each of the first and second side surfaces10 c and 10 d of the respective recesses 10 a and 10 b is notconstituted of a single crystal plane but constituted of two different(111) planes, and the cross-sectional shape thereof becomes convex.

Note that the first and second recesses 10 a and 10 b havingcross-sectional structures similar to the above can also be formed usingan organic alkaline solution instead of the TMAH solution.

Next, as shown in FIG. 13E, SiGe layers are selectively epitaxiallygrown in the recesses 10 a and 10 b by performing the aforementionedstep of FIG. 5E, respectively. The SiGe layers are used as first andsecond source/drain material layers 18 a and 18 b.

Thereafter, the aforementioned steps of FIGS. 5F and 5G are performed,thereby completing the basic structure of a MOS transistor.

According to the present embodiment described above, the fifth impuritydiffusion region 36 having the effect of suppressing the etching ofsilicon in a TMAH solution or an organic alkaline solution has beenformed at a position deeper than the source/drain regions 17 a and 17 bin the silicon substrate 10. Accordingly, similar to the sixthembodiment, when the first and second recesses 10 a and 10 b are formedby etching, the etch rate varies depending on the distance from thesurface of the silicon substrate 10. Consequently, each of the first andsecond side surfaces 10 c and 10 d of the first and second recesses 10 aand 10 b is constituted of two (111) planes, and the first and secondrecesses 10 a and 10 b having convex cross-sectional shapes can beobtained. Thus, similar to the sixth embodiment, stress favorable forthe improvement in the mobility can be applied to the channel from thesource/drain material layers 18 a and 18 b formed in the respectiverecesses 10 a and 10 b.

(8) Eighth Embodiment

FIGS. 14A and 14B are cross-sectional views of a semiconductor deviceaccording to an eighth embodiment of the present invention in theprocess of manufacture, and FIG. 15 is a plan view thereof. In thesedrawings, the components already described in the second to sixthembodiments are denoted by the same reference numerals and codes andwill not be further described below.

In the aforementioned second to fourth embodiments, a substrate with(001) surface orientation is adopted as a silicon substrate in which aMOS transistor is fabricated, and the gate width direction (extendingdirection of the gate electrode) is set to the [110] direction of thesilicon substrate.

On the other hand, in the present embodiment, a silicon substrate with(110) surface orientation is adopted, and the gate width direction(extending direction of a gate electrode) is set to the [111] directionof the silicon substrate.

Adopting such an orientation, after the steps of FIGS. 5A to 5Cdescribed in the second embodiment have been performed, first and secondrecesses 10 a and 10 b having depths of approximately 10 to 100 nm areformed in the silicon substrate 10 beside the gate electrode 14 c byimmersing the silicon substrate 10 in a TMAH solution having a volumeconcentration of 5 to 30% and a temperature of 0 to 50° C., thusobtaining a cross-sectional structure as shown in FIG. 14A.

In the case where the orientation of the silicon substrate 10 is (110)and the extending direction of the gate electrode 14 c is the [111]direction as described above, a (111) plane which is exposed by etchingin the TMAH solution is perpendicular to the surface of the siliconsubstrate 10. Accordingly, the side surfaces of the first and secondrecesses 10 a and 10 b, each of which is constituted of this (111)plane, are perpendicular to the surface of the silicon substrate 10.

FIG. 15 is a plan view after this step has been finished. Theaforementioned FIG. 14A corresponds to a cross-sectional view takenalong the I-I line of FIG. 15.

As shown in FIG. 15, the gate width direction, i.e. the extendingdirection of the gate electrode 14 c, is the [111] direction, and theorientation of the silicon substrate 10 is (110). By adopting such anorientation, the side surfaces of the first and second recesses 10 a and10 b can be made perpendicular to the surface of the silicon substrate10.

Next, as shown in FIG. 14B, SiGe layers are selectively epitaxiallygrown in the recesses 10 a and 10 b by performing the aforementionedstep of FIG. 5E, respectively. The SiGe layers are used as first andsecond source/drain material layers 18 a and 18 b.

Thereafter, the aforementioned steps of FIGS. 5F and 5G are performed,thereby completing the basic structure of a MOS transistor.

According to the present embodiment described above, the siliconsubstrate 10 with (110) orientation has been adopted, and the extendingdirection of the gate electrode 14 c has been set to the [111]direction. Thus, etched surfaces of the silicon substrate 10 which havebeen etched in a TMAH solution or an organic alkaline solution become(111) planes in a direction perpendicular to the surface of the siliconsubstrate 10, and the first and second side surfaces 10 c and 10 d ofthe respective recesses 10 a and 10 b are constituted of the (111)planes. Accordingly, as represented by the arrows in FIG. 14B, uniformstress having a small variation in strength in the depth direction canbe stably applied to the channel from the first and second source/drainmaterial layers 18 a and 18 b in the recesses 10 a and 10 b.

(9) Ninth Embodiment

FIG. 16 is a cross-sectional view of a semiconductor device according toa ninth embodiment of the present invention in the process ofmanufacture, and FIG. 17 is a plan view thereof. In these drawings, thecomponents already described in the eighth embodiment are denoted by thesame reference numerals and codes and will not be further describedbelow.

In the eighth embodiment, the silicon substrate 10 with (110)orientation has been adopted, and the extending direction of the gateelectrode 14 c has been set to the [111] direction.

On the other hand, in the present embodiment, the orientation of asilicon substrate 10 is (110) similarly to the eighth embodiment, butthe extending direction of the gate electrode 14 c is set to the [100]direction.

In the case where such an orientation has been adopted and the steps ofFIGS. 14A and 14B in the eighth embodiment have been performed, (111)planes constituting the first and second side surfaces 10 c and 10 d ofthe first and second recesses 10 a and 10 b come to have a tilt angle θwhich is more gentle than that in the aforementioned second embodiment.

Thus, stress applied to the channel from the first and secondsource/drain material layers 18 a and 18 b steeply changes at positionscloser to the surface layer than at positions deeper in the siliconsubstrate 10. Accordingly, a large stress can be applied to the channel,and the amount of the stress can be easily controlled.

Note that FIG. 17 is a plan view of this semiconductor device and thatFIG. 16 corresponds to a cross-sectional view taken along the II-II lineof FIG. 17.

(10) Tenth Embodiment

Next, a method of evaluating a semiconductor device according to a tenthembodiment of the present invention will be described.

In order to check whether a MOS transistor has characteristics asdesigned, a test transistor called a test element group (TEG) isfabricated in the development phase, and the carrier distribution in thechannel of this transistor is actually physically measured. For therealization of this, it is necessary to expose the surface of a siliconsubstrate, which becomes a channel, to the outside by removing a gateelectrode and a gate insulating film after the MOS transistor has beenfabricated.

However, when the gate electrode and the gate insulating film areremoved, if the silicon substrate is damaged, the carrier distributionin the channel is disturbed, and the obtained measurement value maydeviate from the value in the transistor provided for actual use.

Accordingly, for an evaluation as described above, it is necessary toremove the gate electrode and the gate insulating film while preventingthe silicon substrate from being damaged.

FIGS. 18A to 18E are cross-sectional views showing a method offabricating a TEG used in a test method according to the presentembodiment.

To begin with, steps to be performed before the cross-sectionalstructure shown in FIG. 18A is obtained will be described.

First, an element isolation trench 40 g for shallow trench isolation(STI) is formed in a silicon substrate 40 with (001) surfaceorientation, and then a silicon dioxide layer is buried as an elementisolation insulating film 41 in the element isolation trench 40 g.Thereafter, an n-well 42 is formed in a p-type MOS transistor formationregion delimited by the element isolation insulating film 41 byimplanting phosphorus ions as n-type impurities into the siliconsubstrate 40 under the following conditions: the acceleration energy isapproximately 300 keV or more, and the dose is 1×10¹³ cm⁻² or more.

Subsequently, a gate insulating film 43 which is made of silicon dioxideand which has a thickness of approximately 0.5 to 10.0 nm is formed bythermally oxidizing the surface of the silicon substrate 40, and then apolysilicon layer 44 having a thickness of approximately 20 to 300 nm isformed on the gate insulating film 43 by LPCVD using silane. Here, agate insulating film in which a very small amount of nitrogen is addedto silicon dioxide may be adopted as the gate insulating film 43.

In the aforementioned second embodiment, in order to prevent the gateelectrode from being etched in the TMAH solution, the p-type impuritieshaving the effect of delaying the etch rate have been introduced intothe polysilicon layer 14 (refer to FIG. 5A) constituting the gateelectrode. However, in the present embodiment, since such a slow etchrate makes the removal of a gate electrode difficult, p-type impuritiesare not introduced into the polysilicon layer 44.

Next, steps to be performed before the cross-sectional structure shownin FIG. 18B is obtained will be described.

First, the polysilicon layer 44 is patterned into a gate electrode 44 cby photolithography.

Subsequently, for example, boron ions are implanted as p-type impuritiesinto the silicon substrate 40 using the gate electrode 44 c as a mask,thus shallowly forming first and second source/drain extensions 46 a and46 b in the silicon substrate 40 beside the first and second sidesurfaces 44 a and 44 b of the gate electrode 44 c. As conditions forthis ion implantation, the same ones for actual MOS transistors forcommercial products are adopted. For example, conditions where theacceleration energy is approximately 0.2 to 1.0 keV and where the doseis approximately 1×10¹⁴ to 5×10¹⁵ cm⁻² are adopted. At the same time,pocket implantation of arsenic, phosphorus, antimony, or the like isperformed as needed. Further, first and second source/drain extensions46 a and 46 b using n-type impurities may be shallowly formed.

Thereafter, a silicon dioxide layer having a thickness of approximately5 to 100 nm is formed as a sidewall insulating layer 45 on the entiresurface by CVD using silane, thus covering the first and second sidesurfaces 44 a and 44 b of the gate electrode 44 c with this sidewallinsulating layer 45. Note that, instead of the silicon dioxide layer, asilicon nitride layer may be formed as the sidewall insulating layer 45.

Next, steps to be performed before the cross-sectional structure shownin FIG. 18C is obtained will be described.

First, the sidewall insulating layer 45 is etched back by plasma etchingto leave sidewalls 45 a and 45 b on the first and second side surfaces44 a and 44 b. Further, in this etching, the portion of the gateinsulating film 43 which is not covered with the sidewalls 45 a and 45 bis also etched, whereby the gate insulating film 43 is left only underthe gate electrode 44 c.

Furthermore, similar to the actual MOS transistor for commercialproducts, using the gate electrode 44 c and the sidewalls 45 a and 45 bas a mask, for example, boron ions are implanted as p-type impuritiesinto the silicon substrate 40 under the following conditions: theacceleration energy is approximately 1 to 10 keV, and the dose isapproximately 5×10¹⁴ to 1×10¹⁶ cm⁻². Thus, source/drain regions 47 a and47 b which are deeper and denser than the source/drain extensions 46 aand 46 b are formed in the silicon substrate 40 beside the gateelectrode 44 c. This impurity implantation may be omitted as needed.

Thereafter, the impurities in the source/drain regions 47 a and 47 b areactivated by performing activation anneal under the followingconditions: for example, the substrate temperature is approximately 950to 1050° C., and the processing time is 0 to 10 seconds.

Next, steps to be performed before the cross-sectional structure shownin FIG. 18D is obtained will be described.

First, the silicon substrate 40 is immersed in a TMAH solution having avolume concentration of 5 to 30% and a temperature of 0 to 50° C.,thereby etching the portion of the silicon substrate 40 and the portionof the gate electrode 44 c, which are not covered with silicon dioxide.As in the experimental results shown in FIG. 2, a TMAH solution is veryexcellent in the etch selectivity between silicon and silicon dioxide.Accordingly, in this etching, the erosion of the gate insulating film 43made of a silicon dioxide layer having a small film thickness isnegligibly small, and the channel under the gate insulating film 43 isnot damaged.

Further, by this etching, first and second recesses 40 a and 40 b areformed in the portion of the silicon substrate 40, which is not coveredwith the element isolation insulating film 41 and the sidewalls 45 a and45 b.

Incidentally, this etching may be performed using an organic alkalinesolution instead of the TMAH solution. In that case, damage to thechannel is also small.

Thereafter, the silicon substrate 40 is immersed in an etchant made bymixing HF (hydrofluoric acid) and HCl at a volume ratio of 1:19, and theelement isolation insulating film 41, the sidewalls 45 a and 45 b, andthe gate insulating film 43, which are made of silicon dioxide, arethereby selectively removed. Thus the channel 40 d of which carrierdistribution is to be measured is exposed to the outside as shown inFIG. 18E. The channel 40 d is terminated with hydrogen using hydrogenions contained in the etchant, and is brought into a chemically activestate.

Through the above-described steps, the basic structure of a TEG in whichthe channel 40 d is exposed to the outside is completed.

Next, a method of evaluating a carrier distribution in the channel 40 dof this TEG will be described with reference to FIG. 19.

First, the TEG fabricated through the aforementioned steps is put into ascanning tunneling microscope (STM) which is a kind of probe microscope,and a probe 50 is moved in a plane parallel to the channel 40 d with thetip of the probe 50 in a noncontact state. At this time, a predeterminedvoltage is applied between the probe 50 and the silicon substrate 40,and the value of the tunneling current flowing between the probe and thesilicon substrate 40 changes depending on the carrier distribution inthe channel 40 d. The carrier distribution in the channel 40 d can begrasped by visualizing the change in the tunneling current.

According to the present embodiment described above, the gate electrode44 c is selectively etched using the TMAH solution or an organicalkaline solution as shown in FIG. 18D, and thereafter the gateinsulating film 43 is etched and removed using the etchant made bymixing HF and HCl, thus exposing the channel 40 d as shown in FIG. 18E.

Thus, use of a TMAH solution or an organic alkaline solution, which isexcellent in the selectivity between silicon and silicon dioxide makesit possible to remove only the gate electrode 44 c at a high etchselectivity without damaging the channel region 44 d under the gateelectrode 44 c. Accordingly, in the process of exposing the channel 40d, there is no fear that the carrier distribution in the channel mayfluctuate, and almost the same carrier distribution as that in the MOStransistor provided for actual use can be measured, thus making itpossible to accurately evaluate the performance of the MOS transistor.

Furthermore, according to the present embodiment, since the gateinsulating film 43 is etched and removed using an etchant containing HF,the surface of the channel 40 d which is exposed after the gateinsulating film 43 has been removed is automatically terminated withhydrogen. In the measurement of the carrier distribution using an STM,it is preferable that a surface to be measured is terminated withhydrogen in order to clearly observe the change in conductivity in thesurface to be measured. According to the above, since hydrogentermination can be performed simultaneously with the removal of the gateinsulating film 43, there is no need for a step for hydrogentermination, and the carrier distribution can be easily measured.

FIGS. 20A and 20B are views drawn based on a relief image after thesurface of the TEG of the present embodiment has been actually scannedusing an STM. FIG. 20B is a view in which the brightness in the image ofFIG. 20A is enhanced.

Further, FIG. 21 is an image obtained by observing the carrierdistribution in the channel 40 d of the TEG of FIGS. 20A and 20B usingan STM.

As described previously, in the present embodiment, the channel is lessprone to being damaged when the gate electrode 44 c is etched andremoved. The carrier distribution shown in FIG. 21 is expected to bealmost the same distribution as that in the MOS transistor provided foractual use.

In the present embodiment as described above, it may also be consideredthat plasma etching is adopted for the removal of the gate electrode 44c. However, in plasma etching, as the etching proceeds, more damageoccurs in the channel 40 d through the gate insulating film 43 due tothe kinetic energy of ions in an etching atmosphere. Accordingly, thecarrier distribution fluctuates, and the performance of the MOStransistor cannot be accurately evaluated, unlike the presentembodiment.

Moreover, the MOS transistor to be evaluated in the present embodimentis not limited to a type in which stress is applied to the channel byforming source/drain material layers, such as SiGe layers, in the firstand second recesses 40 a and 40 b. For example, a MOS transistor of ageneral type in which recesses do not exist in actual use can be anobject of evaluation. However, in a TEG for a MOS transistor of thistype, the portion of the silicon substrate 40 having no elementisolation insulating film 41 therein is also etched when the gateelectrode 44 c is etched in the step of FIG. 18D. Accordingly, therecesses 40 a and 40 b are formed in these portions.

(11) Eleventh Embodiment

Next, a method of evaluating a semiconductor device according to aneleventh embodiment of the present invention will be described.

FIG. 22 is a cross-sectional view of a TEG used in the presentembodiment.

In the tenth embodiment, the channel 40 d has been observed using anSTM, which is a kind of probe microscope. On the other hand, in thepresent embodiment, the channel 40 d is observed using a scanningcapacitance microscope.

In the scanning capacitance microscopy, a probe of the microscope andthe channel 40 d constitute a capacitor, and the capacitance value ofthe capacitor is detected, whereby an impurity distribution in thechannel 40 d is observed. In the present embodiment, in order to form adielectric layer of the capacitor, a silicon dioxide layer (dielectriclayer) 51 having a thickness of approximately 1.0 nm as shown in FIG. 22is formed on the surface of the silicon substrate 40 by applying ozoneto the surface of the channel 40 d.

Thereafter, as shown in FIG. 23, the silicon dioxide layer 51 is scannedby the probe 52 with the tip of the probe 52 of the scanning capacitancemicroscope brought into contact with the surface of the silicon dioxidelayer 51, thereby obtaining the carrier distribution in the channel 40 dthrough the silicon dioxide layer 51.

In the case where the channel 40 d is observed using a scanningcapacitance microscope as described above, the removal of the gateelectrode 44 c by wet etching using a TMAH solution similarly to thetenth embodiment makes it possible to prevent damage to the siliconsubstrate 40 and to measure almost the same carrier distribution as thatin the MOS transistor provided for actual use.

Note that, though a scanning capacitance microscope has been used in theabove, use of a scanning spreading resistance microscope instead canalso provide the same advantages as those of the present embodiment.

In the semiconductor device according to the present invention, acrystal plane of a semiconductor substrate constitutes a side surface ofeach of holes in which source/drain material layers are respectivelyformed. Accordingly, stress applied to a channel from the source/drainmaterial layers can be prevented from varying among elements, and thereliability of the semiconductor device can be improved.

Moreover, in the method of manufacturing a semiconductor deviceaccording to the present invention, holes are formed in a siliconsubstrate beside the gate electrode by wet etching using an organicalkaline solution or a TMAH solution as an etchant. Accordingly, acrystal plane of the semiconductor substrate is exposed at each etchedsurface, and the crystal plane constitutes a side surface of each hole.Thus, excellent reproducibility comes to be shown, and stress is appliedto the channel from the source/drain material layers, which are formedin the holes, without variation among elements even in the case whereMOS transistors are integrally formed in the semiconductor substrate.

Furthermore, in the method of evaluating a semiconductor deviceaccording to the present invention, since a gate electrode is removed byetching using an organic alkaline solution or a TMAH solution, damagedoes not easily occur in a channel in etching, and a carrierdistribution in the channel is not easily disturbed. Accordingly, acarrier distribution in a state similar to that of actual use can beobtained.

1. A semiconductor device comprising: a semiconductor substrate which isa silicon substrate, a surface orientation of the silicon substrate is(110); a gate insulating film and a gate electrode which are formed onthe semiconductor substrate in this order; and a source/drain materiallayer formed in a hole in the semiconductor substrate, the hole beinglocated beside the gate electrode and the source/drain material layerbeing a SiGe layer, wherein a side surface of the hole which is closerto the gate electrode is defined by a (111) plane of the siliconsubstrate.
 2. The semiconductor device according to claim 1, wherein theside surface of the hole includes two crystal planes, and across-sectional shape of the side surface is concave.
 3. Thesemiconductor device according to claim 1, wherein the side surface ofthe hole includes two crystal planes, and a cross-sectional shape of theside surface is convex.
 4. The semiconductor device according to claim3, wherein a buried insulating layer is formed under the hole in thesemiconductor substrate.
 5. The semiconductor device according to claim1, wherein the side surface of the hole includes a single crystal planeperpendicular to the semiconductor substrate.
 6. The semiconductordevice according to claim 5, wherein a gate width direction of the gateelectrode is a [111] direction of the silicon substrate.
 7. Thesemiconductor device according to claim 1, wherein a gate widthdirection of the gate electrode is a [100] direction of the siliconsubstrate.
 8. The semiconductor device according to claim 1, wherein asidewall is formed on a side surface of the gate electrode, and an upperend portion of the hole goes under the sidewall and is brought closer toa channel under the gate electrode.
 9. The semiconductor deviceaccording to claim 1, wherein the entire gate electrode is made ofsilicide of refractory metal.
 10. The semiconductor device according toclaim 1, wherein the source/drain material layer is a metal layer.